D2S based in San Jose, Ca is a emerging leader in Design for Ebeam
(DFEB) is a design and software approach to enhance the throughput of
e-beam lithographic exposure. DFEB uses advanced projection
technology combined with design and software techniques to reduce a
design's required shot count, a key component in mask cost. D2S is a
highly innovative company that is small, nimble, and very successful
in its vision to have ebeam technology take a leading role in the EDA
industry. D2S is a well funded firm who has taken a leadership role
in the evangelism of ebeam technology forming a consortium of over 40
different vendors in the industry.
Director/ VP Modeling (Very Hands On role)
Requirements (Individuals must possess 8+ years in OPC/ILT modeling)
Must-Have" Requirements: • OPC/ILT modeling experience
• statistics, data mining, modeling (mask, wafer, process, yield,)
• strong knowledge of equations/methods used to model
- eBeam scattering
- resist development
- thermal effects on wafer/mask
• handy with scripting languages, elementary programming in C or other language
• demonstrated knowledge of calibration methods and managing empirical data
"Nice-to-Have" Requirements:
• PhD in Physics, EE
• presentable to customers, able to persuasively explain complex
technical ideas and methods
• emerging or existing (good) reputation among peers in mask lithography arena.
• strong management skills (planning, leading, recruiting, coaching,
directing, training, delegating)
• Matlab, Mathematica, SAS, JMP, R, SPSS applications experience
D2S is a premier player in ebeam technology. We are in the forefront
of introducing disruptive technology that will enable chips to be made
quicker, more efficient, and more affordable. We offer an excellent
compensation/ benefits with lucrative stock options offered as well.
Take advantage of this opportunity NOW, Please send your information
to herbnj@gmail.com
