Director/ VP Modeling (Very Hands On role)
Model-Based Mask Data Preparation is an emerging field of the last step in semiconductor design that outputs the format that writes the photo-masks. It is a unique electron beam lithography simulation-based approach to mask data preparation, protected by granted patents. (www.design2silicon.com) D2S is a highly innovative company that is small, nimble, and very successful in its vision to have ebeam technology take a leading role in the EDA industry. D2S is a well funded firm who has taken a leadership role in the evangelism of ebeam technology with the eBeam Initiative (www.ebeam.org), a consortium of over 40 different vendors in the industry.
Job Responsibilities
- Key leadership role responsible for defining and directing D2S mask and wafer modeling activities
-Create accurate , efficient models for mask processes (exposure , develop, etch at the 20mm node and below
-Create models to ArF and EUV mask technologies
-Work with developers to install models in D2S products test and verify
-Engage with customers on test mask design, fabrication, measurement,, analysis, model calibration
-Build organization an define operational procedures for customer model calibration as part of normal sales process
-Project modeling competency for D2S via customer presentations and conference appearances
-Build systems for customer data acquisition, data preparation, modeling and calibration, data maintenance and archival
Requirements (Individuals must possess 8+ years in OPC/ILT modeling)
| Must-Have" Requirements: | • OPC/ILT modeling experience | ||||||||||||
| • statistics, data mining, modeling (mask, wafer, process, yield,) | |||||||||||||
| • strong knowledge of equations/methods used to model | |||||||||||||
| - eBeam scattering | |||||||||||||
| - resist development | |||||||||||||
| - thermal effects on wafer/mask | |||||||||||||
| • understanding of computer science, machine & program performance, limitations, implementations, efficiency | |||||||||||||
| • handy with scripting languages, elementary programming in C or other language | |||||||||||||
| • demonstrated knowledge of calibration methods and managing empirical data | |||||||||||||
| • familiarity with test pattern design | |||||||||||||
| • ability to explain complex subjects in layman's terms, accent okay but clear thinking required | |||||||||||||
| • ability to organize and execute complex projects | |||||||||||||
| • high energy level, ability to respond quickly to customer demands | |||||||||||||
| • strong PPT presentation experience, 1/wk | |||||||||||||
| "Nice-to-Have" Requirements: | |||||||||||||
| • PhD in Physics, EE | |||||||||||||
| • presentable to customers, able to persuasively explain complex technical ideas and methods | |||||||||||||
| • emerging or existing (good) reputation among peers in mask lithography arena, as evidenced | |||||||||||||
| by papers given, talks, university research, etc. | |||||||||||||
| • strong management skills (planning, leading, recruiting, coaching, directing, training, delegating) | |||||||||||||
| • strong written communications skills | |||||||||||||
| • Matlab, Mathematica, SAS, JMP, R, SPSS applications experience D2S is a premier player in ebeam technology. We are in the forefront of introducing disruptive technology that will enable chips to be made quicker, more efficient, and more affordable. We offer an excellent compensation/ benefits with lucrative stock options offered as well. Take advantage of this opportunity NOW, Please send your information to herbnj@gmail.com | |||||||||||||
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